Secular trends in facial anthropometry among Chilean workers: Implications for ergonomic respirator design and fit panel adaptation

Edgardo C. SilvaHéctor Ignacio CastellucciRoberto CamberesJosefina LiraJaime MarabolíCarlos VivianiJohan F.M. MolenbroekToon HuysmansAriel RodríguezLuis Alberto CarocaJaime Ibacache2026-02-242026-02-242025-1110.1016/j.apergo.2025.104594https://cris-uv-2.scimago.es/handle/123456789/8377Secular trends in facial anthropometry among Chilean workers: Implications for ergonomic respirator design and fit panel adaptationjournal-article