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  4. Secular trends in facial anthropometry among Chilean workers: Implications for ergonomic respirator design and fit panel adaptation
 
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Secular trends in facial anthropometry among Chilean workers: Implications for ergonomic respirator design and fit panel adaptation

Journal
Applied Ergonomics
Date Issued
2025-11
Author(s)
Edgardo C. Silva
Héctor Ignacio Castellucci
Facultad de Medicina  
Roberto Camberes
Josefina Lira
Jaime Marabolí
Carlos Viviani
Johan F.M. Molenbroek
Toon Huysmans
Ariel Rodríguez
Luis Alberto Caroca
Jaime Ibacache
DOI
10.1016/j.apergo.2025.104594

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